Modern FPGAs are large enough to implement Multi-Processor Systems-on-Chip (MPSoCs). Commercial FPGA companies also provide system design tools that abstract sufficient low-level system details to allow non-FPGA experts to design these systems for new applications. The application presented herein was designed by photomask researchers to implement a new technique for measuring the transparency of bimetallic grayscale masks using an FPGA platform. Production of the bimetallic grayscale masks requires a direct-write laser system. Previously, system calibration was determined by writing large rectangles of varying transparency on a mask and then measuring them using a spectrometer.