Emerging Applications for High K Materials in VLSI Technology

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Provided by: MDPI AG
Topic: Hardware
Format: PDF
The current status of high K dielectrics in Very Large Scale Integrated circuit (VLSI) manufacturing for leading edge Dynamic Random Access Memory (DRAM) and Complementary Metal Oxide Semiconductor (CMOS) applications is summarized along with the deposition methods and general equipment types employed. Emerging applications for high K dielectrics in future CMOS are described as well for implementations in 10nm and beyond nodes. Additional emerging applications for high K dielectrics include resistive RAM memories, Metal-Insulator-Metal (MIM) diodes, ferro-electric logic and memory devices and as mask layers for patterning.
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