Use of Lithography Simulation for the Calibration of Equation-Based Design Rule Checks

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Provided by: Association for Computing Machinery
Topic: Hardware
Format: PDF
Designers using one-dimension measurements in nanometer designs can't readily identify features prone to excessive variation during processing. Process simulation provides high resolution checking, but requires significant computing resources. The equation-based Design Rule Checking (eqDRC) offers the DRC performance with capture of complex process issues using multi-dimensional equations. One challenge to adopting eqDRC is the definition and calibration of the equations. The authors will show how a lithographic simulator can be used to define and calibrate an eqDRC equation.
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